Image sensor having shielding structure

ABSTRACT

An image sensor is provided. The image sensor includes a substrate, a first interlayer insulating layer, a first metal line, and a shielding structure. The substrate includes a pixel array, a peripheral circuit area, and an interface area disposed between the pixel array and the peripheral circuit area. The first interlayer insulating layer is formed on a first surface of the substrate. The first metal line is disposed on the first interlayer insulating layer of the pixel array. The second interlayer insulating layer is disposed on the first interlayer insulating layer wherein the second interlayer insulating layer covers the first metal line. The shielding structure passes through the substrate in the interface area wherein the shielding structure electrically insulates the pixel array of the substrate and the peripheral circuit area.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims under 35 U.S.C. §119 priority to and the benefitof Korean Patent Application No. 10-2014-0109920 filed on Aug. 22, 2014,the entire contents of which are incorporated by reference herein.

BACKGROUND

1. Technical Field

The present disclosure relates to a layout and a vertical structure of asemiconductor device including a shielding structure and a method ofmanufacturing the same.

2. Discussion of Related Art

An image sensor having a more high resolution for a high quality displayimage is being developed. Since the image sensor of a high resolutionhas a high degree of integration and a small size, an active pixelsensor array is affected by electrical, magnetic, and thermal effectsfrom peripheral circuits. The effects from the peripheral circuits maydegrade the operation and performance of the image sensor. Thus, theactive pixel sensor array should be shielded from the electrical,magnetic and thermal effects of the peripheral circuit, so that theoperation and performance of the image sensor is improved.

SUMMARY

Exemplary embodiments of the inventive concepts provide an image sensorhaving a shielding structure.

Other exemplary embodiments of the inventive concepts provide a methodof manufacturing the image sensor having the shielding structure.

In accordance with an aspect of the inventive concepts, an image sensorincludes a substrate, a first interlayer insulating layer, a first metalline, and a shielding structure. The substrate includes a pixel array, aperipheral circuit area, and an interface area disposed between thepixel array and the peripheral circuit area. The first interlayerinsulating layer is formed on a first surface of the substrate. Thefirst metal line is disposed on the first interlayer insulating layer ofthe pixel array. The second interlayer insulating layer is disposed onthe first interlayer insulating layer, wherein the second interlayerinsulating layer covers the first metal line. The shielding structurepasses through the substrate in the interface area to electricallyisolate the pixel array of the substrate from the peripheral circuitarea.

In accordance with another aspect of the inventive concepts, an imagesensor includes a substrate, a first interlayer insulating layer, apixel line, a through via line, a second interlayer insulating layer, athrough via structure, and a shielding structure. The substrate includesa pixel array, a through via area, and a shield area disposed betweenthe pixel array and the through via area. The first interlayerinsulating layer is formed on a first surface of the substrate. Thepixel line is disposed on the first interlayer insulating layer of thepixel array. The through via line is disposed on the first insulatinglayer in the through via area. The second interlayer insulating layer isdisposed on the first interlayer insulating layer, wherein the secondinterlayer insulating layer covers the pixel line and the through vialine. The through via structure passes through the substrate in thethrough via area. The shielding structure passes through the substratein the shield area. The through via structure includes a via structureand a via isolation structure. The via structure passes through thesubstrate and the first interlayer insulating layer. The via isolationstructure passes through the substrate to surround the via structure.The shielding structure passes through the substrate to electricallyisolate the pixel array of the substrate from the through via area.

In accordance with still another aspect of the inventive concepts, animage sensor includes a substrate, a first interlayer insulating layer,a first metal line, a second metal line, a second interlayer insulatinglayer, a through via structure, and a shielding structure. The substrateincludes a first area and a second area. The first interlayer insulatinglayer is formed on a first surface of the substrate. The first metalline is disposed on the first interlayer insulating layer in the firstarea. The second metal line is disposed on the first interlayerinsulating layer in the second area. The second interlayer insulatinglayer is disposed on the first interlayer insulating layer to cover thefirst and second metal lines. The through via structure is disposed inthe first area. The shielding structure is disposed in the second area.The through via structure includes a through via plug passing throughthe substrate and the first interlayer insulating layer in the firstarea to be electrically connected to the first metal line. The shieldingstructure includes a shield insulating material layer passing throughthe substrate in the second area and contacts the first interlayerinsulating layer.

BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing and other features and advantages of the inventiveconcepts will be apparent from the more particular description ofexemplary embodiments of the inventive concepts, as illustrated in theaccompanying drawings in which like reference characters refer to thesame parts throughout the different views. The drawings are notnecessarily to scale, emphasis instead being placed upon illustratingthe principles of the inventive concepts. In the drawings:

FIGS. 1A, 1B and 1C are conceptual block diagrams of image sensors inaccordance with exemplary embodiments of the inventive concepts;

FIGS. 2A, 2B and 2C are conceptual cross-sectional views of the imagesensors in accordance with exemplary embodiments of the inventiveconcepts;

FIGS. 3A, 3B, 3C, 4A, 4B, 5A and 5B show methods of manufacturing theimage sensors in accordance with exemplary embodiments of the inventiveconcepts;

FIGS. 6A and 6B are top views or layouts of image sensors in accordancewith exemplary embodiments of the inventive concepts;

FIGS. 7A and 7B are conceptual cross-sectional views of image sensors inaccordance with exemplary embodiments of the inventive concepts;

FIGS. 8A, 8B, 8C, 8D, 8E, 8F, 8G, 9A, 9B, 9C and 9D show methods ofmanufacturing the image sensor in accordance with exemplary embodimentsof the inventive concepts;

FIG. 10A is a schematic block diagram for describing a camera systemincluding the image sensor in accordance with exemplary embodiments ofthe inventive concepts; and

FIG. 10B is a conceptual block diagram of an electronic system inaccordance with an exemplary embodiment of the inventive concepts.

DETAILED DESCRIPTION

Various exemplary embodiments will now be described more fully withreference to the accompanying drawings. The inventive concepts disclosedherein may, however, be embodied in different forms and should not beconstrued as limited to the exemplary embodiments set forth herein.Rather, these exemplary embodiments are provided so that this disclosureis thorough and complete and fully conveys the inventive concepts tothose skilled in the art. In the drawings, the sizes and relative sizesof layers and regions may be exaggerated for clarity.

The terminology used herein is for the purpose of describing particularexemplary embodiments only and is not intended to be limiting of thepresent inventive concepts. As used herein, the singular forms “a,” “an”and “the” are intended to include the plural forms as well, unless thecontext clearly indicates otherwise. It will be further understood thatthe terms “comprises” and/or “comprising,” when used in thisspecification, specify the presence of stated features, integers, steps,operations, elements, and/or components, but do not preclude thepresence or addition of one or more other features, integers, steps,operations, elements, components, and/or groups thereof.

It will be understood that when an element or layer is referred to asbeing “on,” “connected to” or “coupled to” another element or layer, itcan be directly on, connected or coupled to the other element or layeror intervening elements or layers may be present. Like numerals refer tolike elements throughout. As used herein, the term “and/or” includes anyand all combinations of one or more of the associated listed items.

Spatially relative terms, such as “beneath,” “below,” “lower,” “above,”“upper” and the like, may be used herein for ease of description todescribe one element's or feature's relationship to another element(s)or feature(s) as illustrated in the figures. It will be understood thatthe spatially relative terms are intended to encompass differentorientations of the device in use or operation in addition to theorientation depicted in the figures. For example, if the device in thefigures is turned over, elements described as “below” or “beneath” otherelements or features would then be oriented “above” the other elementsor features. Thus, the term “below” can encompass both an orientation ofabove and below. The device may be otherwise oriented (rotated 90degrees or at other orientations) and the spatially relative descriptorsused herein interpreted accordingly.

Exemplary embodiments are described herein with reference tocross-sectional illustrations that are schematic illustrations ofidealized embodiments (and intermediate structures). As such, variationsfrom the shapes of the illustrations as a result, for example, ofmanufacturing techniques and/or tolerances, are to be expected. Thus,the exemplary embodiments should not be construed as limited to theparticular shapes of regions illustrated herein but are to includedeviations in shapes that result, for example, from manufacturing. Forexample, an implanted region illustrated as a rectangle will, typically,have rounded or curved features and/or a gradient of implantconcentration at its edges rather than a binary change from implanted tonon-implanted region. Likewise, a buried region formed by implantationmay result in some implantation in the region between the buried regionand the surface through which the implantation takes place. Thus, theregions illustrated in the figures are schematic in nature and theirshapes are not intended to illustrate the actual shape of a region of adevice and are not intended to limit the scope of the present inventiveconcepts.

Like numbers refer to like elements throughout. Thus, the same orsimilar numbers may be described with reference to other drawings evenif they are neither mentioned nor described in the correspondingdrawing. Also, elements that are not denoted by reference numbers may bedescribed with reference to other drawings.

It will be understood that, the terms of ‘front side’ and ‘back side’are relative terms to conveniently explain the present inventiveconcepts. Thus, ‘front side’ and ‘back side’ do not correspond topredetermined directions, locations or elements, and ‘front side’ may besubstituted by ‘back side’. For example, ‘front side’ may mean ‘backside’. Thus, ‘front side’ may be described as ‘first side’, and ‘backside’ may be described as ‘second side’. Also, ‘back side’ may bedescribed as ‘first side, and ‘front side’ may be described as ‘firstside’. However, in the same embodiment, ‘front side’ may not besubstituted by ‘back side’. It will be understood that, although theterms “first,” “second,” “third,” etc. may be used herein to describevarious elements, components, regions, layers and/or sections, theseelements, components, regions, layers and/or sections should not belimited by these terms. These terms are only used to distinguish oneelement, component, region, layer or section from another element,component, region, layer or section. Thus, a first element, component,region, layer or section discussed below could be termed a secondelement, component, region, layer or section without departing from theteachings of the present inventive concepts.

FIGS. 1A to 1C are conceptual block diagrams of image sensors 10A, 10B,10C in accordance with exemplary embodiments of the inventive concepts.

Referring to FIGS. 1A to 1C, the image sensor 10A includes a pixel arrayPA, peripheral circuit areas PCA, an interface areas IA, and a shieldingstructure 50 formed in the interface areas IA. The pixel array PA isdisposed on a center of the image sensor 10A, and includes pixels. Forexample, the pixel array PA may include an active pixel sensor arrayAPS. The peripheral circuit areas PCA are disposed on the periphery ofthe pixel array PA. A register block, a timing generator, a rampgenerator, a buffer circuit, a correlated double sampler, a comparator,an analog-to-digital converter, and the like, may be included in theperipheral circuit areas PCA. The interface areas IA may be disposedbetween the pixel array PA and the peripheral circuit areas PCA.

The shielding structure 50 may be disposed between the pixel array PAand the peripheral circuit areas PCA. For example, the shieldingstructure 50 may be formed in the interface areas IA. The shieldingstructure 50 may enhance electrical insulation, magnetic shielding, andthermal isolation between the pixel array PA and the peripheral circuitareas PCA.

Referring to FIG. 1A, the shielding structure 50 may surround the pixelarray PA. Referring to FIG. 1B, the shielding structure 50 may surroundthe pixel array PA and the peripheral circuit areas PCA. Referring toFIG. 1C, the shielding structure 50 may individually surround each ofthe peripheral circuit areas PCA. In another exemplary embodiment, theshielding structure 50 may surround only some of the peripheral circuitareas PCA.

In the image sensors 10A, 10B, 10C in accordance with the exemplaryembodiments of the inventive concepts, the peripheral circuit area PCAis electrically and physically insulated and separated from the pixelarray PA. Thus, since the electrical and thermal effects on the unitpixels of the pixel array PA from the peripheral circuit areas PCA aredecreased, a dark current and a white spot are decreased. Therefore,electrical, thermal, and optical operations and performances of theimage sensors 10A, 10B, 10C may be superior.

FIGS. 2A, 2B and 2C are conceptual cross-sectional views of the imagesensors 11A, 11B, 11C in accordance with exemplary embodiments of theinventive concepts. FIGS. 2A to 2C each include cross-sectional views ofthe peripheral circuit areas PCA, the interface area IA, and the pixelarray PA shown in FIGS. 1A to 1C.

Referring to FIG. 2A, the image sensor 11A includes a substrate 20,transistors 27L, 27P, a lower interlayer insulating layer 30, an upperinterlayer insulating layer 35, multilayered metal lines 40L, 40P,shallow isolation areas 21, photodiodes 25, deep isolation areas 23, ashielding structure 50, a capping layer 60, a protection layer 65, colorfilters 70, and microlenses 75. The substrate 20 may be disposed in eachof the peripheral circuit area PCA, the interface area IA and the pixelarray PA. The transistors 27L, 27P, the lower interlayer insulatinglayer 30, the upper interlayer insulating layer 35, and the multilayeredmetal lines 40L, 40P are disposed on a first surface S1 of the substrate20. The shallow isolation areas 21, the photodiodes 25, the deepisolation areas 23, the shielding structure 50 are formed in thesubstrate 20. The capping layer 60, the protection layer 65, the colorfilters 70, and the microlenses 75 are disposed on a second surface S2of the substrate 20. The second surface S2 of the substrate 20 may beopposite the first surface S1 of the substrate 20. For example, thefirst surface S1 may be a front side surface of the substrate 20, andthe second surface S2 may be a back side surface of the substrate 20.Alternatively, the first surface S1 may be the back side surface of thesubstrate 20, and the second surface S2 may be the front side surface ofthe substrate 20.

The transistors 27L, 27P may include logic transistors 27L and a pixeltransistor 27P. In an exemplary embodiment, the logic transistors 27Lare disposed in the peripheral circuit area PCA, and the pixeltransistor 27P is disposed in the pixel array PA. The logic transistors27L may form a logic circuit, a differential amplifier, a driver, or aninput/output buffer, etc. The pixel transistor 27P may be one of atransmission transistor, a reset transistor, and an amplificationtransistor.

The lower interlayer insulating layer 30 may be formed on the firstsurface S1 of the substrate 20 to cover the transistors 27L, 27P. Thelower interlayer insulating layer 30 may include an insulating materialsuch as, for example, silicon oxide.

The upper interlayer insulating layer 35 may be formed on the lowerinterlayer insulating layer 30 to cover the multilayered metal lines40L, 40P. The upper interlayer insulating layer 35 may have amultilayered structure. The upper interlayer insulating layer 35 mayinclude an insulating material such as silicon oxide or silicon nitride.

The multilayered metal lines 40L, 40P may be formed in the upperinterlayer insulating layer 35 as the multilayered structure. Themultilayered metal lines 40L, 40P may include logic metal lines 40L andpixel lines 40P. The logic metal lines 40L are disposed in theperipheral circuit area PCA. The pixel lines 40P are disposed in thepixel array PA. The multilayered metal lines 40L, 40P may include ametal such as tungsten (W), aluminum (Al), copper (Cu), etc.

The shallow isolation areas 21 may include an insulating material formedusing a shallow trench isolation (STI) process. The deep isolation areas23 may include an insulating material formed using a deep trenchisolation (DTI) process. The photodiodes 25 may include a P-doped areaand an N-doped area which are formed by ion implanting process.

The shielding structure 50 may include a shield insulating material 51filled in a shield trench 50T that passes through the substrate 20 in avertical direction. The shielding structure 50 may pass through thesubstrate 20 to electrically and physically insulate and separate thepixel array PA of the substrate 20 from the peripheral circuit area PCAof the substrate 20. A lower end portion of the shielding structure 50may pass through the first surface S1 of the substrate 20 and protrudeinto the lower interlayer insulating layer 30. An upper end portion ofthe shielding structure 50 may protrude at a higher level than thesecond surface S2 of the substrate 20. The shield insulating material 51may include an insulating material such as silicon oxide. A height ofthe shielding structure 50 may be same as a height of the deep isolationareas 23.

The capping layer 60 may be entirely formed on the second surface S2 ofthe substrate 20. The capping layer 60 may include the same material asthe shield insulating material 51 to physically continue with the shieldinsulating material 51. An upper surface of the capping layer 60 may beco-planar with an upper surface of the shielding structure 50.

The protection layer 65 may be formed on the capping layer 60. Theprotection layer 65 may have a multilayered structure to include ananti-reflection layer or a passivation layer. For example, theprotection layer 65 may include silicon nitride, silicon oxide, siliconoxynitride, a polyimide, and/or an organic polymer.

The color filters 70 may be formed on the protection layer 65 to bealigned perpendicular to the photodiodes 25. The color filters 70 mayinclude silicon oxide or an organic polymer including pigment.

The microlenses 75 may be aligned perpendicular to the color filters 70.The microlenses 75 may include transparent silicon oxide or an organicpolymer.

Referring to FIG. 2B, the image sensor 11B according to an exemplaryembodiment of the inventive concepts may include a shielding structure50 having a shield trench 50T, a shield insulating material 51 and ashield core 52 compared with the image sensor 11A shown in FIG. 2A. Theshield insulating material 51 may be conformally formed on a side walland a bottom surface of the shield trench 50T to partially fill theshield trench 50T. The shield insulating material 51 may include siliconoxide or silicon nitride. The shield core 52 may be formed on the shieldinsulating material 51 to completely fill the shield trench 50T. Theshield core 52 may protrude at a higher level than the second surface S2of the substrate 20. The shield core 52 may include a metal. An uppersurface of the shield core 52 may be co-planar with an upper surface ofthe shield insulating material 51. The shield core 52 may include abarrier layer and a metal layer.

Referring to FIG. 2C, the image sensor 11C according to an exemplaryembodiment of the inventive concepts may include a shielding structure50 having a shield trench 50T, a shield insulating material 51, a shieldcore 52, and a shield pad 53 compared with the image sensors 11A, 11Bshown in FIGS. 2A and 2C. A positive voltage (+), a negative voltage(−), or a ground voltage may be applied to the shield core 52 throughthe shield pad 53. The shield pad 53 may include the same material asthe shield core 52 to physically continue with the shield core 52. Theshield pad 53 may be disposed on the capping layer 60. The protectionlayer 65 may have an opening O which exposes an upper surface of theshield pad 53. The shield pad 53 may include a barrier layer and a metallayer.

In the image sensors 11A, 11B, 11C, the peripheral circuit areas PCA ofthe substrate 20 are electrically and physically insulated and separatedfrom the pixel array PA of the substrate 20.

FIGS. 3A to 3C are views for describing a method of manufacturing theimage sensor in accordance with exemplary embodiments of the inventiveconcepts.

Referring to FIG. 3A, the method of manufacturing the image sensoraccording to an exemplary embodiment of the inventive concepts mayinclude preparing a substrate 20 including a peripheral circuit areaPCA, an interface area IA, and a pixel array PA, forming shallowisolation areas 21 and photodiodes 25 in the substrate 20, formingtransistors 27L, 27P on a first surface S1 of the substrate 20, forminga lower interlayer insulating layer 30 on the first surface S1 of thesubstrate to cover the transistors 27L, 27P, and forming a plurality ofmultilayered metal lines 40L, 40P and an upper interlayer insulatinglayer 35 on the lower interlayer insulating layer 30.

The interface area IA may be disposed between the peripheral circuitarea PCA and the pixel array PA.

The substrate 20 may include one of a single crystalline wafer, a Si—Gewafer, and a silicon on insulator (SOI) wafer.

The forming of the shallow isolation areas 21 may include performing ashallow trench isolation (STI) process. The forming of the photodiodes25 may include performing an ion implanting process such as ionimplanting or ion diffusion. The forming of the transistors 27L, 27P mayinclude forming a gate insulating layer, a gate electrode, and a gatespacer on the substrate 20. The transistors 27L, 27P may include logictransistors 27L and pixel transistors 27P. The logic transistors 27L areformed in the peripheral circuit area PCA. The pixel transistors 27P aredisposed in the pixel array PA.

The forming of the lower interlayer insulating layer 30 and the upperinterlayer insulating layer 35 may include forming a silicon oxide byperforming a chemical vapor deposition (CVD) process. The lowerinterlayer insulating layer 30 and the upper interlayer insulating layer35 may be formed as a multilayer.

The forming of the metal lines 40L, 40P may include performing a CVDprocess, a photolithography process, an etching process, a depositionprocess, and/or a planarization process. For example, the metal lines40L, 40P may include tungsten (W), aluminum (Al), copper (Cu), titanium(Ti), or another metal, a metal alloy, or a metal compound.

Referring to FIG. 3B, the method may include turning over the substrate20, thinning the substrate 20 to partially recess and remove the secondsurface S2 of the substrate 20, and forming a shield trench 50T and adeep isolation trench 23T in the substrate 20. The thinning of thesubstrate 20 may include performing a grinding process, a polishingprocess, or an etching process. The shield trench 50T may be formed inthe interface area IA. The deep isolation trench 23T may be formedbetween the photodiodes 25 in the pixel array PA. The shield trench 50Tand the deep isolation trench 23T may be formed to have the same depth.The shield trench 50T and the deep isolation trench 23T may pass throughthe substrate 20 so that lowest bottom surfaces of the shield trench 50Tand the deep isolation trench 23T may be disposed in the lowerinterlayer insulating layer 30.

Referring to FIG. 3C, the method may include forming a shieldingstructure 50, deep isolation areas 23, and a capping layer 60 byperforming a CVD process and/or a gap filling process shieldingstructure and forming a protection layer 65 on the capping layer 60. Theshielding structure 50 may include a shield insulating material 51filling the shield trench 50T. The deep isolation areas 23 may include adeep isolation insulating material 231 filling the deep isolationtrenches 23T. The shield insulating material 51, the deep isolationinsulating material 231, and the capping layer 60 may be simultaneouslyformed to include the same material. For example, the shield insulatingmaterial 51, the deep isolation insulating material 231, and the cappinglayer 60 may include an insulating material such as silicon oxide orsilicon nitride. The capping layer 60 may be entirely formed on thesecond surface S2 of the substrate 20. The protection layer 65 mayinclude an anti-reflection layer. The protection layer 65 may be formedas a multilayered structure. For example, the protection layer 65 mayinclude one of silicon nitride, silicon oxide, a polyimide, and anorganic polymer.

Referring back to FIG. 2A, the method may include forming color filters70 and microlenses 75 on the protection layer 65 in the pixel array PAto be aligned perpendicular to the photodiodes 25. The color filters 70may include one of silicon oxide and an organic polymer includingpigment. The microlenses 75 may include one of silicon oxide, apolyimide, and an organic polymer.

FIGS. 4A and 4B are cross-sectional views of a method of manufacturingthe image sensor in accordance with exemplary embodiments of theinventive concepts.

Referring to FIG. 4A, the method of manufacturing the image sensorsaccording to an exemplary embodiment of the inventive concepts mayinclude forming a shield trench 50T and a deep isolation trench 23T byperforming the processes described with reference to FIGS. 3A to 3C, andforming a shield insulating material 51 in the shield trench 50T and adeep isolation insulating material 231 in the deep isolation trench 23T,respectively. The shield insulating material 51 may not completely fillthe shield trench 50T in an exemplary embodiment. The shield insulatingmaterial 51 may partially fill the shield trench 50T, or may beconformally formed on a side wall and a bottom surface of the shieldtrench 50T. The deep isolation insulating material 231 may completelyfill the deep isolation trench 23T in an exemplary embodiment.

Referring to FIG. 4B, the method may include forming a shield core 52,configured to fill the shield trench 50T, on the shield insulatingmaterial 51 in the shield trench 50T by performing a CVD process and aCMP process. The shield core 52 may include a conductive material suchas a metal. In the forming of the shield core 52, a shielding structure50 including the shield insulating material 51 and the shield core 52which fill the shield trench 50T may be formed.

Referring back to FIG. 2B, the method may include forming a protectionlayer 65 in the capping layer 60, and forming color filters 70 andmicrolenses 75 so as to be aligned perpendicular to the photodiodes 25on the protection layer 65 in the pixel array PA.

FIGS. 5A and 5B are cross-sectional views of a method of manufacturingthe image sensors in accordance with an exemplary embodiment of theinventive concepts. Referring to FIG. 5A, the method of manufacturingthe image sensors may include forming a shield core metal layer 50M byperforming the processes described with reference to FIGS. 3A to 3C, and4A. The shield core metal layer 50M may be entirely formed on thecapping layer 60 to completely fill the shield trench 50T.

Referring to FIG. 5B, the method may include patterning the shield coremetal layer 50M by performing a photolithography process and an etchingprocess so as to form a shield core 52 and a shield pad 53. The shieldcore 52 and the shield pad 53 are electrically connected, and includethe same material to be physically continued.

Referring back to FIG. 2C, the method may include forming a protectionlayer 65 on the capping layer 60 and the shield pad 53, forming anopening O which exposes a surface of the shield pad 53 by patterning theprotection layer 65, and forming color filters 70 and microlenses 75 onthe protection layer 65 in the pixel array PA so as to be alignedperpendicular to the photodiodes 25.

In a method of manufacturing the image sensors according to embodimentsof the inventive concepts, the deep isolation areas 23 and the shieldingstructure 50 may be simultaneously formed using compatible processes.Thus, since the number of the processes is decreased, manufacturingcosts may be decreased and productivity may be improved.

FIGS. 6A and 6B are top views or layouts of image sensors in accordancewith exemplary embodiments of the inventive concepts.

Referring to FIG. 6A, the image sensor 10D according to an exemplaryembodiment of the inventive concepts may include a through via area VA,a shield area SA, and a pixel array PA. Referring back to FIGS. 1A to1C, the through via area VA may be located at a portion or the peripheryof the peripheral circuit area PCA. The shield area SA may be a portionof the interface area IA. The pixel array PA may be a portion of thepixel array PA.

The through via area VA may include a through via plug 81, a through viapad 83, and a through via isolation structure 85. The through via pad 83may overlap the through via plug 81. The through via isolation structure85 may surround the through via plug 81 and the through via pad 83.

The shield area SA may include a shielding structure 50 and a shield pad53 that overlaps a portion of the shielding structure 50.

The pixel array PA may include a plurality of unit pixels P. Each of theunit pixels P may include four photodiode areas 25 and a circuit area26.

Referring to FIG. 6B, the image sensor 10E according to an exemplaryembodiment of the inventive concepts may further include a through vialine 40V and a shield line 40S compared with the image sensor 10D shownin FIG. 6A. The through via line 40V and the shield line 40S mayelectrically connect the through via plug 81 to the shielding structure50. The through via line 40V may be electrically connected with theshield line 40S crossing the through via area VA and the shield area SA.

The image sensors 10D, 10E according to exemplary embodiments of theinventive concepts may include the shielding structure 50 having aconductive material. The peripheral circuit area PCA or the through viaarea VA may be electromagnetically separated from the pixel array PA.Thus, the electromagnetic interference onto the pixel array PA from theperipheral circuit area PCA and the through via area VA may bedecreased.

FIGS. 7A and 7B are conceptual cross-sectional views of image sensors inaccordance with exemplary embodiments of the inventive concepts. FIG. 7Ashows cross-sectional views taken along lines I-I′ II-II′, and III-III′shown in FIG. 6A. FIG. 7B shows cross-sectional views taken along linesIV-IV′ V-V′, and VI-VI′ shown in FIG. 6B.

Referring to FIG. 7A, the image sensor 11D according to an exemplaryembodiment of the inventive concepts may include a substrate 20, atransistor 27, a lower interlayer insulating layer 30, an upperinterlayer insulating layer 35, metal lines 40V, 40P, a shallowisolation area 21, photodiodes 25, a deep isolation areas 23, a throughvia structure 80, a shielding structure 50, a capping layer 60, aprotection layer 65, color filters 70, and microlenses 75. The substrate20 includes a through via area VA, a shield area SA, and a pixel arrayPA. The transistor 27, the lower interlayer insulating layer 30, theupper interlayer insulating layer 35, and the metal lines 40V, 40P aredisposed on a first surface S1 of the substrate 20. The shallowisolation area 21, the photodiodes 25, the deep isolation areas 23, thethrough via structure 80 and the shielding structure 50 are formed inthe substrate 20. The capping layer 60, the protection layer 65, thecolor filters 70, and the microlenses 75 are disposed on a secondsurface S2 of the substrate 20.

The metal lines 40V, 40P may include a through via line 40V and pixellines 40P. The through via line 40V is disposed in the upper interlayerinsulating layer 35 in the through via area VA. The pixel lines 40P aredisposed in the upper interlayer insulating layer 35 in the pixel arrayPA. The through via line 40V may be electrically connected to thethrough via structure 80. The metal lines 40V, 40P may include tungsten(W), aluminum (Al), copper (Cu), or another metal.

The through via structure 80 may include a through via plug 81, athrough via pad 83, and a through via isolation structure 85. Thethrough via plug 81 is disposed in a through via 81H. The through viapad 83 is disposed on the through via plug 81. The through via isolationstructure 85 surrounds the through via plug 81.

The through via plug 81 may include a through via barrier layer 81B anda through via metal layer 81M. The through via barrier layer 81B isconformally formed on an inner surface of the through via 81H. Thethrough via metal layer 81M fills the through via 81H. The through viapad 83 may include a through via pad barrier layer 83B and a through viapad metal layer 83M. The through via pad barrier layer 83B is disposedon the capping layer 60. The through via pad metal layer 83M is disposedon the through via pad barrier layer 83B. The through via barrier layer81B and the through via pad metal layer 83M may include the samematerial so as to physically continue, and the through via metal layer81M and the through via pad metal layer 83M may include the samematerial so as to physically continue. The through via plug 81 may beelectrically connected to the through via line 40V.

The shielding structure 50 may include a shield insulating material 51,a shield core 52, and a shield pad 53. The shield insulating material 51is disposed in a shield trench SOT. The shield core 52 is disposed in ashield core trench 52T in the shield insulating material 51. The shieldpad 53 is disposed on the shield core 52. The shield core trench 52T maypass through the shield insulating material 51 and the lower interlayerinsulating layer 30. The shield core 52 may include a shield corebarrier layer 52B and a shield core metal layer 52M. The shield corebarrier layer 52B and the shield core metal layer 52M are conformallyformed on an inner surface of the shield core trench 52T. The shield pad53 may include a shield pad barrier layer 53B and a shield pad metallayer 53M. The shield pad barrier layer 53B is disposed on the cappinglayer 60. The shield pad metal layer 53M is disposed on the shield padbarrier layer 53B. The shield core barrier layer 52B and the shield padbarrier layer 53B may have the same material so as to physicallycontinue with the shield pad barrier layer 53B. The shield core metallayer 52M and the shield pad metal layer 53M may have the same materialso as to physically continue with the shield pad metal layer 53M. Apositive voltage (+), a negative voltage (−), or a ground voltage may beapplied to the shield core 52 through the shield pad 53.

An upper surface of the through via pad 83 may be exposed through afirst opening O1 of the protection layer 65. An upper surface of theshield pad 53 may be exposed through a second opening O2 of theprotection layer 65.

Referring to FIG. 7B, the image sensor 11E according to an exemplaryembodiment of the inventive concepts may further include a shield line40S disposed in the shield area SA compared with the image sensor 10Dshown in FIG. 7A. The shield line 40S may be disposed on the samehorizontal level as the through via line 40V. The shield line 40S may beelectrically connected to the through via line 40V. The shield line 40Smay be electrically connected to the shield core 52. An upper surface ofthe shield pad 53 may not be exposed, and is covered by the protectionlayer 65. In another embodiment, the shield pad 53 may not be formed andmay be omitted. A positive voltage (+), a negative voltage (−), or aground voltage may be applied to the shield core 52 through the throughvia pad 83, the through via plug 81, the through via line 40V, and theshield line 40S.

Since the image sensors 11D, 11E according to exemplary embodiments ofthe inventive concepts include the shield core 52 having a conductivematerial, electromagnetic effects on the pixel array PA from the throughvia area VA may be decreased. Further, as a voltage may be applied tothe shield core 52, electromagnetic shield characteristics and heatdissipation characteristics may be superior.

FIGS. 8A to 8G are views for describing a method of manufacturing theimage sensor in accordance with exemplary embodiments of the inventiveconcepts.

Referring to FIG. 8A, a method of manufacturing the image sensoraccording to an exemplary embodiment of the inventive concepts mayinclude preparing a substrate 20 including a through via area VA, ashield area SA, and a pixel array PA, forming a shallow isolation area21 and photodiodes 25 in the substrate 20 of the pixel array PA, andforming a transistor 27, a lower interlayer insulating layer 30, metallines 40V, 40P, and an upper interlayer insulating layer 35 on a firstsurface S1 of the substrate 20.

The metal lines 40V, 40P may include a through via line 40V and a pixelline 40P. The through via line 40V is disposed in the through via areaVA. The pixel line 40P is disposed in the pixel array PA. The throughvia line 40V and the pixel line 40P may be disposed on the same level asthe lowermost pixel line 40P in the pixel array PA.

Referring to FIG. 8B, the method may include turning over the substrate20, thinning the substrate 20 to partially recess and remove the secondsurface S2 of the substrate 20, and forming a through via isolationtrench 85T, a shield trench 50T, and a deep isolation trench 23T in thesubstrate 20. Referring back to FIG. 6A, the via isolation trench 85Tmay be in a closed polygonal shape, the shield trench 50T may be in alinear shape, and the deep isolation trench 23T may be in a matrix shapeto surround the photodiodes 25 in a top view.

Referring to FIG. 8C, an exemplary embodiment may include performing aCVD process and/or a gap filling process to fill an insulating materialin the via isolation trench 85T, the shield trench 50T and the deepisolation trench 23T to form a via isolation insulating material 851, apreliminary shielding structure 50P, and a deep isolation area 23. Themethod may also include forming a capping layer 60 on the second surfaceS2 of the substrate 20.

Referring to FIG. 8D, an exemplary embodiment may include forming a maskpattern M on the capping layer 60, and etching the capping layer 60 andthe substrate 20 using the mask pattern M as an etch mask to form athrough via 81H that passes through the capping layer 60 and thesubstrate 20 in the through via area VA to expose the through via line40V. An exemplary embodiment may also include forming a shield coretrench 52T in the shield area SA. The shield core trench 52T may passthrough the shield insulating material 51 and the lower interlayerinsulating layer 30. A lower end of the shield core trench 52T may belocated in the upper interlayer insulating layer 35. Then, the maskpattern M may be removed.

Referring to FIG. 8E, the method may include forming a barrier layer BLand a metal layer ML by performing a CVD process, a physical vapordeposition (PVD) process, an atomic layer deposition (ALD) process,and/or a plating process. The barrier layer BL may be conformally formedon an inner surface of the through via 81H, an inner surface of theshield core trench 52T, and the capping layer 60. The metal layer ML maybe formed on the barrier layer BL to fill the through via 81H and theshield core trench 52T. The barrier layer BL may include a barrier metaland/or a seed metal. The barrier layer BL may include titanium (Ti),titanium nitride (TiN), titanium tungsten (TiW), or another metal. Themetal layer ML may include tungsten (W), aluminum (Al), copper (Cu), oranother metal.

Referring to FIG. 8F, an exemplary embodiment may include patterning themetal layer ML and the barrier layer BL by performing a photolithographyprocess or an etching process to form a through via structure 80 and ashielding structure 50. The through via structure 80 may include athrough via plug 81 and a through via pad 83. The shielding structure 50may include a shield core 52 and a shield pad 53. The through via pad 83may include a through via pad barrier layer 83B and the through via padmetal layer 83M. The shield pad 53 may include a shield pad barrierlayer 53B and a shield pad metal layer 53M.

Referring to FIG. 8G, an exemplary embodiment may include forming aprotection layer 65 on the capping layer 60. The protection layer 65includes a first opening O1 which exposes an upper surface of thethrough via pad 83 and a second opening O2 which exposes an uppersurface of the shield pad 53.

Referring back to FIG. 7A, an exemplary embodiment may include formingcolor filters 70 and microlenses 75 on the protection layer 65. Thecolor filters 70 and the microlenses 75 are aligned perpendicular to thephotodiodes 25.

Referring to FIG. 9A, a method of manufacturing the image sensoraccording to an exemplary embodiment of the inventive concepts mayperforming the processes described with reference to FIG. 8A, preparinga substrate 20 including a through via area VA, a shield area SA, and apixel array PA, forming a shallow isolation area 21 and photodiodes 25in the pixel array PA of the substrate 20, and forming a transistor 27,a lower interlayer insulating layer 30, metal lines 40V, 40S, and 40P,and an upper interlayer insulating layer 35 on a first surface S1 of thesubstrate 20.

The metal lines 40V, 40S, 40P may include a through via line 40V, ashield line 40S, and a pixel line 40P. The through via line 40V isdisposed in the through via area VA. The shield line 40S is disposed inthe shield area SA. The pixel line 40P is disposed in the pixel arrayPA. The through via line 40V and the shield line 40S may be located atthe same level as the lowermost pixel line 40P of the metal lines 40V,40S, 40P. The through via line 40V and the shield line 40S may beelectrically and physically connected.

Referring to FIG. 9B, an exemplary embodiment may include forming a viaisolation structure 85, a preliminary shielding structure 50, aplurality of deep isolation areas 23, and a capping layer 60 byperforming the processes described with reference to FIGS. 8B to 8D,forming a mask pattern M, forming a through via 81H in the through viaarea VA, and forming a shield core trench 52T in the shield area SA. Thethrough via 81H exposes the through via line 40V. The shield core trench52T exposes the shield line 40S. Then, the mask pattern M may beremoved.

Referring to FIG. 9C, an exemplary embodiment may include forming athrough via structure 80 and a shielding structure 50 by performing theprocesses described with reference to FIGS. 8E and 8F. The through viastructure 80 may include a through via plug 81 and a through via pad 83.The shielding structure 50 may include a shield core 52 and a shield pad53. The through via pad 83 may include a through via pad barrier layer83B and a through via pad metal layer 83M. The shield pad 53 may includea shield pad barrier layer 53B and a shield pad metal layer 53M.Alternatively, the shield pad 53 may not be formed.

Referring to FIG. 9D, an exemplary embodiment may include forming aprotection layer 65 on the capping layer 60. The protection layer 65includes an opening O which exposes an upper surface of the through viapad 83. An upper surface of the shield pad 53 may not be exposed but maybe covered by the protection layer 65.

Referring back to FIG. 7B, an exemplary embodiment may include formingcolor filters 70 and microlenses 75 on the protection layer 65. Thecolor filters 70 and the microlenses 75 may be aligned perpendicular tothe photodiodes 25.

FIG. 10A is a schematic block diagram for describing a camera systemincluding one of the image sensors 10A, 10B, 10C, 10D, 10E, 11A, 11B,11C, 11D, 11E in accordance with exemplary embodiments of the inventiveconcepts. Referring to FIG. 10A, a camera system 400 according to anexemplary embodiment of the inventive concepts may include an imagesensing part 410, an image signal processing part 420, and an imagedisplay part 430. The image sensing part 410 may include a controlregister block 411, a timing generator 412, a ramp generator 413, abuffer part 414, an active pixel sensor array 415, a row driver 416, acorrelated double sampler (CDS) 417, a comparator 418, and ananalog-to-digital converter 419. The control register block 411 maycontrol overall operations of the camera system 400. The controlregister block 411 may directly apply operation signals to the timinggenerator 412, the ramp generator 413, and the buffer part 414. Thetiming generator 412 may generate various signals that may be referencesignals for operation timings of various components of the image sensingpart 410. The operation timing reference signals generated by the timinggenerator 412 may be transmitted to the row driver 416, the CDS 417, thecomparator 418, and/or the analog-to-digital converter 419, etc. Theramp generator 413 may generate and transmit a ramp signal that may beused for the CDS 417 and/or the comparator 418. The buffer part 414 mayinclude a latch part. The buffer part 414 may temporarily store an imagesignal that may be transmitted to the outside. The active pixel sensorarray 415 may detect an external image. The active pixel sensor array415 may include a plurality of active pixel sensors. Each of the activepixel sensors may include one of the image sensors 10A, 10B, 10C, 10D,10E, 10F, 10G, 10H having a back irradiation typed image sensor inaccordance with an exemplary embodiment of the inventive concepts. Therow driver 416 may selectively activate a row of the active pixel sensorarray 415. The CDS 417 may sample and output an analog signal generatedfrom the active pixel sensor array 415. The comparator 418 may comparedata transmitted from the CDS 417 and a slope of a ramp signal which isa feedback from the analog reference voltages and then generate variousreference signals. The analog-to-digital converter 419 may convertanalog image data to digital image data.

FIG. 10B is a conceptual block diagram of an electronic system 500 inaccordance with an exemplary embodiment of the inventive concepts.Referring to FIG. 10B, the electronic system 500 according to anexemplary embodiment of the inventive concepts may include a bus 510, animage sensing unit 520 capable of inputting and outputting signals ordata through the bus 510, a central processing unit 530, and aninput/output unit 540. The electronic system 500 may further include amemory drive 550. The electronic system 500 may further include anoptical disc drive (ODD) 560. The electronic system 500 may furtherinclude an external communication unit 570. The image sensing unit 520may include one of the image sensors 10A, 10B, 10C, 10D, 10E, 11A, 11B,11C, 11D, 11E in accordance with exemplary embodiments of the inventiveconcepts. The central processing unit 530 may include a microprocessor.The input/output unit 540 may include one among various input devicesincluding an operation button, a switch, a keyboard, a mouse, a keypad,a touch pad, a scanner, a camera, an optical sensor, etc., or one amonga liquid crystal display (LCD), a light emitting diode (LED) and/or acathode ray tube (CRT) monitor, a printer, and/or a device fordisplaying various visual information. The memory drive 550 may includea dynamic random access memory (DRAM), a static random access memory(SRAM), a phase changeable random access memory (PRAM), a resistiverandom access memory (RRAM), a magnetic random access memory (MRAM), anon-volatile memory (NVM), a flash memory, a solid state drive (SSD), ahard disk (HD), and/or various memory devices, or a drive thereof. Forexample, the ODD 560 may include a compact disc-read only memory(CD-ROM) drive, a digital video disc (DVD) drive, etc. The externalcommunication unit 570 may include a modem, a local area network (LAN)card, or a universal serial bus (USB), etc., and may include an externalmemory, a wireless broadband internet (WiBro) communication device, aninfrared ray communication device, etc.

In image sensors according to exemplary embodiments of the inventiveconcepts, a substrate of the pixel array are insulated, shielded andseparated from the electrical, magnetic, material, and physical effectsof the substrate of the peripheral circuit region. Thus, the electricaland thermal effects on the unit pixels of the pixel array from theperipheral circuits are decreased, and then a dark current, a white spotdefect can be decreased and the heat can be easily dissipated.Therefore, the electrical, thermal, and optical operations andperformances of the image sensors can be improved.

The foregoing is illustrative of exemplary embodiments and is not to beconstrued as limiting thereof. Although a few exemplary embodiments havebeen described, those skilled in the art will readily appreciate thatmany modifications are possible in the exemplary embodiments withoutmaterially departing from the novel teachings and advantages.Accordingly, all such modifications are intended to be included withinthe scope of this inventive concepts as defined in the claims. In theclaims, means-plus-function clauses are intended to cover the structuresdescribed herein as performing the recited function, and not onlystructural equivalents but also equivalent structures. Therefore, it isto be understood that the foregoing is illustrative of various exemplaryembodiments and is not to be construed as limited to the specificexemplary embodiments disclosed, and that modifications to the disclosedexemplary embodiments, as well as other embodiments, are intended to beincluded within the scope of the appended claims.

What is claimed is:
 1. An image sensor comprising: a substratecomprising a pixel array, a through via area, and a shield area disposedbetween the pixel array and the through via area; a first interlayerinsulating layer formed on a first surface of the substrate; a pixelline disposed on the first interlayer insulating layer in the pixelarray; a through via line disposed on the first interlayer insulatinglayer in the through via area; a second interlayer insulating layerdisposed on the first interlayer insulating layer, the second interlayerinsulating layer covering the pixel line and the through via line; athrough via structure configured to pass through the substrate in thethrough via area; and a shielding structure passing through thesubstrate in the shield area, wherein the through via structureincludes: a through via structure passing through the substrate and thefirst interlayer insulating layer; and a via isolation structure passingthrough the substrate and surrounding the via structure, and wherein theshielding structure passes through the substrate and electricallyinsulates between the pixel array and the through via area of thesubstrate.
 2. The image sensor of claim 1, wherein the via isolationstructure comprises: a via isolation trench passing through thesubstrate; and a via isolation insulating material filling the viaisolation trench, wherein the shielding structure comprises: a shieldtrench vertically passing through the substrate; and a shield insulatingmaterial filling the shield trench, and wherein the via isolation trenchhas a same depth as the shield trench.
 3. The image sensor of claim 2,wherein the through via structure comprises: a through via passingthrough the substrate and the first insulating layer; and a through viaplug filling the through via, wherein the shielding structure comprises:a shield core trench passing through the shield insulating material andthe first interlayer insulating layer; and a shield core filling theshield core trench, and wherein the through via has a same depth as theshield core trench.
 4. The image sensor of claim 3, further comprising ashield line disposed on the first interlayer insulating layer in theshield area, wherein the shield line is electrically connected to theshield core, and the through via line is electrically connected to thethrough via plug.
 5. The image sensor of claim 4, wherein the shieldline is electrically connected to the through via line.
 6. The imagesensor of claim 3, wherein the through via structure comprises a throughvia pad disposed on a second surface of the substrate, and wherein thethrough via pad is electrically connected to the through via plug.
 7. Animage sensor comprising: a substrate comprising a first area and asecond area; a first interlayer insulating layer formed on a firstsurface of the substrate; a first metal line disposed on the firstinterlayer insulating layer in the first area, and a second metal linedisposed on the first interlayer insulating layer in the second area; asecond interlayer insulating layer disposed on the first interlayerinsulating layer, and covering the first and second metal lines; and athrough via structure disposed in the first area and a shieldingstructure disposed in the second area, wherein the through via structurecomprises a through via plug passing through the substrate and the firstinterlayer insulating layer in the first area, and electricallyconnected to the first metal line, and wherein the shielding structurecomprises a shield insulating material passing through the substrate inthe second area, and contact the first interlayer insulating layer. 8.The image sensor of claim 7, wherein the through via structure furthercomprises a via isolation insulating material passing through thesubstrate and surrounding the through via plug, and wherein the viaisolation insulating material has the same height as the shieldinsulating material.
 9. The image sensor of claim 7, wherein theshielding structure further comprises a shield core passing through theshield insulating material and the first interlayer insulating layer,and electrically connected to the second metal line, and wherein theshield core has the same height as the through via plug.
 10. The imagesensor of claim 9, further comprising a through via pad disposed on asecond surface of the substrate, and electrically connected to thethrough via plug, and wherein the first metal line is electricallyconnected to the second metal line.
 11. The image sensor of claim 10,further comprising a shield pad disposed on the second surface of thesubstrate, and electrically connected to the shield core.